HYDROXYAPATITE TITANIUM INTERFACE REACTION INDUCED BY KEV ELECTRON-IRRADIATION

Thin films of hydroxyapatite bioceramic, 5-50 angstrom in thickness, have been deposited on ion cleaned titanium surfaces to study the chemical-physical adhesion of metal-ceramic interfaces of biomedical devices (orthopaedic and dentistry prosthesis). Film deposition was performed in ultrahigh vacuum condition (10(-10) mbar) using 5 keV argon sputtering of hydroxyapatite matrix; the film thickness was measured in situ with Auger electron spectroscopy. The hydroxyapatite-titanium interface was irradiated with an electron beam of 0.5-5 keV energy and 0.2-2 A/cm2 current density. During electron irradiation, Auger spectra show chemical shifts of phosphorus, titanium and oxygen peaks. The released electron energy induces modifications in the tetraedric phosphorus-oxygen groups with production of new chemical bonds between phosphorus, oxygen and titanium. Oxygen, for example, diffuses into the titanium interface forming titanium oxide. Chemical reactions induced by electron irradiation are driven by the metal-ceramic interface. Near the interface a strong and fast effect is observed while far from the interface a weak and slow effect occurs. Chemical reactions depend on the electron irradiation dose showing an inhibition threshold at about 10(19) e/cm2 and, near the interface, a saturation condition at about 5 x 10(20) e/cm2. Titanium-ceramic chemical reactions are inhibited if the substrate titanium surface is rich in oxide.