FABRICATION AND ELECTRICAL-PROPERTIES OF EPITAXIAL LAYERS OF GAAS DOPED WITH MANGANESE

被引:14
作者
GOUSKOV, L [1 ]
BILAC, S [1 ]
PIMENTEL, J [1 ]
GOUSKOV, A [1 ]
机构
[1] UNIV ESTADUAL CAMPINAS, INST FIS GLEB WATAGHIN, CAMPINAS, SP, BRAZIL
关键词
D O I
10.1016/0038-1101(77)90039-9
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:653 / 656
页数:4
相关论文
共 10 条
[1]   THERMAL ACTIVATION-ENERGY OF MANGANESE ACCEPTORS IN GALLIUM-ARSENIDE AS A FUNCTION OF IMPURITY SPACING [J].
BLAKEMORE, JS ;
BROWN, WJ ;
STASS, ML ;
WOODBURY, DA .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (07) :3352-3354
[2]   TRANSPORT AND PHOTOELECTRICAL PROPERTIES OF GALLIUM-ARSENIDE CONTAINING DEEP ACCEPTORS [J].
BROWN, WJ ;
BLAKEMOR.JS .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (05) :2242-&
[3]   RESIDUAL ACCEPTORS IN NATURAL GASB AND GAXIN1-XSB - THEIR CONTRIBUTION TO TRANSPORT BETWEEN 4.7 AND 300 DEGREES K [J].
CAMPOS, MD ;
GOUSKOV, A ;
GOUSKOV, L ;
PONS, JC .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (06) :2642-2646
[4]   ELECTRICAL PROPERTIES OF N-TYPE GERMANIUM [J].
DEBYE, PP ;
CONWELL, EM .
PHYSICAL REVIEW, 1954, 93 (04) :693-706
[5]   BAND STRUCTURE AND ELECTRON TRANSPORT OF GAAS [J].
EHRENREICH, H .
PHYSICAL REVIEW, 1960, 120 (06) :1951-1963
[6]   PREPARATION AND PROPERTIES OF MN-DOPED EPITAXIAL GALLIUM-ARSENIDE [J].
KORDOS, P ;
JANSAK, L ;
BENC, V .
SOLID-STATE ELECTRONICS, 1975, 18 (03) :223-226
[7]  
MADELUNG O, 1964, PHYSICS III V COMPOU
[8]  
SEAGEN EH, 1974, PHYS REV B, V10, P1760
[9]   BEHAVIOR OF MANGANESE IN GAAS [J].
VIELAND, LJ .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (06) :2007-&
[10]   IMPURITY CONDUCTION AND METAL-NONMETAL TRANSITION IN MANGANESE-DOPED GALLIUM-ARSENIDE [J].
WOODBURY, DA ;
BLAKEMOR.JS .
PHYSICAL REVIEW B, 1973, 8 (08) :3803-3810