SPIRAL GROWTH OF INP BY METALORGANIC VAPOR-PHASE EPITAXY

被引:9
作者
HSU, CC
XU, JB
WILSON, IH
机构
[1] Department of Electronic Engineering, Chinese University of Hong Kong, Shatin, NT
关键词
D O I
10.1063/1.112062
中图分类号
O59 [应用物理学];
学科分类号
摘要
Spirals were observed on InP grown by metalorganic vapor phase epitaxy. Atomic force microscopy is the technique used. The growth took place on a vicinal surface and the growth mechanism is according to the classical Burton-Cabrera-Frank theory. Spirals originate from screw dislocations. Successive turns of steps are sent out by the dislocations. These steps are generally of monolayer height (0.29 nm) except close to the dislocation emergence points where they are submonolayers. It is predicted that spiral growth will become the dominant mechanism if the vicinal steps are eliminated.
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页码:1394 / 1396
页数:3
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