PLASMA-ENHANCED CVD OF HIGH-QUALITY INSULATING FILMS

被引：41

作者：

BATEY, J

TIERNEY, E

STASIAK, J

NGUYEN, TN

机构：

来源：

APPLIED SURFACE SCIENCE | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90415-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：1 / 15

页数：15

共 16 条

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