HIGH-STRESS LOW-TEMPERATURE DISLOCATION KINETICS OF GE

被引:21
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JOHNSON, OW
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10.1063/1.1702958
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O59 [应用物理学];
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页码:3247 / &
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[1]   THEORY OF DISLOCATION MOBILITY IN SEMICONDUCTORS [J].
CELLI, V ;
THOMSON, R ;
KABLER, M ;
NINOMIYA, T .
PHYSICAL REVIEW, 1963, 131 (01) :58-&
[2]   VELOCITIES AND DENSITIES OF DISLOCATIONS IN GERMANIUM AND OTHER SEMICONDUCTOR CRYSTALS [J].
CHAUDHURI, AR ;
PATEL, JR ;
RUBIN, LG .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (09) :2736-&
[3]   MECHANISMS OF MICROCRACK GROWTH IN MAGNESIUM OXIDE CRYSTALS [J].
CLARKE, FJP ;
TATTERSALL, HG ;
SAMBELL, RAJ .
PHILOSOPHICAL MAGAZINE, 1962, 7 (75) :393-&
[4]   INDENTATION OF GERMANIUM AT ROOM TEMPERATURE [J].
CRAIG, JV ;
PUGH, EN .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (11) :3417-&
[5]  
DRUCKER DC, 1963, FRACTURE SOLIDS, V20
[6]   PLASTIC DEFORMATION OF GERMANIUM AND SILICON [J].
GALLAGHER, CJ .
PHYSICAL REVIEW, 1952, 88 (04) :721-722
[7]  
JOHNSON OW, 1963, J APPL PHYS, V34, P2582
[8]  
JOHNSON OW, 1963, FRACTURE SOLIDS, V20
[9]   DISLOCATION VELOCITIES, DISLOCATION DENSITIES, AND PLASTIC FLOW IN LITHIUM FLUORIDE CRYSTALS [J].
JOHNSTON, WG ;
GILMAN, JJ .
JOURNAL OF APPLIED PHYSICS, 1959, 30 (02) :129-144
[10]   DISLOCATION MOBILITY IN GERMANIUM [J].
KABLER, MN .
PHYSICAL REVIEW, 1963, 131 (01) :54-&