ON THE OUT-DIFFUSION OF OXYGEN FROM SILICON

被引：32
|
作者：
GAWORZEWSKI, P [1 ]
RITTER, G [1 ]
机构：
[1] VEB HALBEITERWERK FRANKFURT,FRANKFURT,FED REP GER
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1981年 / 67卷 / 02期
关键词：
D O I：
10.1002/pssa.2210670220
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：511 / 516
页数：6
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