400-A HIGH ASPECT-RATIO LINES PRODUCED IN POLYMETHYL METHACRYLATE (PMMA) BY ION-BEAM EXPOSURE

被引：42
作者：
KARAPIPERIS, L
LEE, CA
机构：
[1] CORNELL UNIV,SCH ELECT ENGN,ITHACA,NY 14853
[2] CORNELL UNIV,NATL RES & RESOURCE FACIL SUBMICRON STRUCT,ITHACA,NY 14853
来源：
APPLIED PHYSICS LETTERS | 1979年 / 35卷 / 05期
关键词：
D O I：
10.1063/1.91137
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We report preliminary results on the fabrication of 400- and 2600-Å deep lines in polymethyl methacrylate (PMMA) by means of H+ exposure through a holographically produced fine conformal gold mask.
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页码：395 / 397
页数：3
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