HIGH-SPEED CMOS-SOS ICS FABRICATED USING X-RAY-LITHOGRAPHY

被引：2
|
作者：
STOVER, HL [1 ]
HAUSE, FL [1 ]
MCGREIVY, D [1 ]
机构：
[1] HUGHES NEWPORT BEACH RES CTR,NEW BEACH,CA 90265
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期
关键词：
D O I：
10.1116/1.570260
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1635 / 1639
页数：5
相关论文
共 50 条
  • [41] EFFICIENT EXTRACTION WINDOW FOR HIGH-THROUGHPUT X-RAY-LITHOGRAPHY BEAMLINES
    KURODA, K
    KANEKO, T
    ITABASHI, S
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1995, 66 (02): : 2151 - 2153
  • [42] HIGH-RESOLUTION THICK MASK PATTERN FABRICATION FOR X-RAY-LITHOGRAPHY
    ONO, T
    OZAWA, A
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (11) : 2311 - 2312
  • [43] REPLICATION OF 175-A LINES AND SPACES IN POLYMETHYLMETHACRYLATE USING X-RAY-LITHOGRAPHY
    FLANDERS, DC
    APPLIED PHYSICS LETTERS, 1980, 36 (01) : 93 - 96
  • [44] COMPLETE X-RAY-LITHOGRAPHY PROCESSING OF AN 8-LEVEL 0.4 MICRON CMOS TEST DEVICE
    STAUDTFISCHBACH, P
    WINDBRACKE, W
    BERNT, H
    ZWICKER, G
    FRIEDRICH, D
    SCHLIWINSKI, HJ
    LANGE, P
    HEMICKER, P
    HUBER, HL
    SCHEUNEMANN, U
    SIMON, K
    MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 153 - 156
  • [45] REPAIR OF X-RAY-LITHOGRAPHY MASKS USING UV-LASER PHOTODEPOSITION
    RANDALL, JN
    EHRLICH, DJ
    TSAO, JY
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 262 - 264
  • [46] POSSIBILITIES FOR PROJECTION X-RAY-LITHOGRAPHY USING HOLOGRAPHIC OPTICAL-ELEMENTS
    HOWELLS, MR
    JACOBSEN, C
    APPLIED OPTICS, 1991, 30 (13): : 1580 - 1582
  • [47] A TECHNIQUE FOR PROJECTION X-RAY-LITHOGRAPHY USING COMPUTER-GENERATED HOLOGRAMS
    JACOBSEN, C
    HOWELLS, MR
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (06) : 2993 - 3001
  • [48] FABRICATION OF SURFACE ACOUSTIC-WAVE DEVICES BY USING X-RAY-LITHOGRAPHY
    YOSHIOKA, N
    SAKAI, A
    MORIMOTO, H
    HOSONO, K
    WATAKABE, Y
    WADAKA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1688 - 1691
  • [49] 50-NM X-RAY-LITHOGRAPHY USING SYNCHROTRON-RADIATION
    CHEN, Y
    KUPKA, RK
    ROUSSEAUX, F
    CARCENAC, F
    DECANINI, D
    RAVET, MF
    LAUNOIS, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06): : 3959 - 3964
  • [50] USING AN ELECTRON-BEAM GUN OF AXIAL TYPE FOR X-RAY-LITHOGRAPHY
    SCHILLER, S
    NEUMANN, M
    DURNER, F
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C111 - C111
12345