SURFACE NANOSTRUCTURE AND ITS RELATION TO DEPOSITION CONDITIONS OF THIN CARBONACEOUS FILMS AS MEASURED BY AN ATOMIC-FORCE MICROSCOPE

被引：0

作者：

LEHMBERG, H

PAGNIA, H

GRPEL, M

LACOSTE, T

机构：

[1] Institut für Angewandte Physik der Technischen Hochschule Darmstatlt, Darmstadt, 64289

[2] Matematicko-Fyzikalni Fakulta, University Karlovy, Icatedra Elektroniky a Vakuove Fysiky, Praha 8, 180 00

来源：

INTERNATIONAL JOURNAL OF ELECTRONICS | 1994年 / 76卷 / 05期

关键词：

D O I：

10.1080/00207219408926002

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Hard carbonaceous films (a-C:H) were grown by dissociating butane in an RF-diode sputtering system. The effects of dilution of the butane with argon, target bias, and deposition time on surface structure and final film thickness have been monitored by means of an atomic force microscope with lateral force capability and by Tolansky interference microscopy.

引用

页码：941 / 946

页数：6

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