OXYGEN-PRESSURE AS A PARAMETER IN THE DC PLASMA ANODIZATION OF SILICON

被引：17
作者：
BECK, RB
PATYRA, M
RUZYLLO, J
JAKUBOWSKI, A
机构：
来源：
THIN SOLID FILMS | 1980年 / 67卷 / 02期
关键词：
D O I：
10.1016/0040-6090(80)90458-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：261 / 264
页数：4
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