OPTIMUM THICKNESS FOR THERMOMAGNETIC WRITING

被引：2

|

作者：

SILVERMAN, BD ^{[1
]}

机构：

[1] IBM CORP, RES LAB, SAN JOSE, CA 95114 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 12期

关键词：

D O I：

10.1063/1.1661091

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：5163 / 5165

页数：3

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