CRYSTALLIZATION OF AMORPHOUS TI-SI ALLOY THIN-FILMS - MICROSTRUCTURE AND RESISTIVITY

被引：24

作者：

RAAIJMAKERS, IJMM

VANOMMEN, AH

READER, AH

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 10期

关键词：

D O I：

10.1063/1.343353

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3896 / 3906

页数：11

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