INFLUENCE OF DEPOSITION CONDITIONS ON THE PROPERTIES OF SPUTTER-DEPOSITED CO-V THIN-FILMS

被引：3

作者：

THOMPSON, JA ^{[1
]}

STEVENSON, DA ^{[1
]}

机构：

[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 08期

关键词：

D O I：

10.1063/1.337824

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3155 / 3157

页数：3

共 50 条

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[26] Influence of deposition parameters on mechanical properties of sputter-deposited Cr2O3 thin films [J].

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[27] FORMATION OF CRYSTALLOGRAPHIC TEXTURE IN RF SPUTTER-DEPOSITED CR THIN-FILMS [J].

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[28] Microstructure of sputter-deposited Co/Si multilayer thin films [J].

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[29] NMR-STUDY ON COMPOSITIONAL DISTRIBUTION IN SPUTTER-DEPOSITED CO-NI THIN-FILMS [J].

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[30] Effect of deposition conditions on mechanical stresses and microstructure of sputter-deposited molybdenum and reactively sputter-deposited molybdenum nitride films [J].

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