INFLUENCE OF DEPOSITION CONDITIONS ON THE PROPERTIES OF SPUTTER-DEPOSITED CO-V THIN-FILMS

被引：3
|
作者：
THOMPSON, JA [1 ]
STEVENSON, DA [1 ]
机构：
[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 08期
关键词：
D O I：
10.1063/1.337824
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：3155 / 3157
页数：3
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