LASER-ASSISTED ETCHING OF MANGANESE-ZINC-FERRITE

被引：15

作者：

YUNG, EK ^{[1
]}

HUSSEY, BW ^{[1
]}

GUPTA, A ^{[1
]}

ROMANKIW, LT ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 03期

关键词：

D O I：

10.1149/1.2096707

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：665 / 673

页数：9

共 16 条

[1]

BAUERLE D, 1986, SPRINGER SERIES MATE, V1, P162

[2] MAGNETISM MICROSTRUCTURE AND CRYSTAL CHEMISTRY OF SPINEL FERRITES [J].

VANGROENOU, AB ;

BONGERS, PF ;

STUYTS, AL .

MATERIALS SCIENCE AND ENGINEERING, 1969, 3 (06) :317-+

[3] SI ETCHING AFFECTED BY IR LASER IRRADIATION [J].

BUNKIN, FV ;

LUKYANCHUK, BS ;

SHAFEEV, GA ;

KOZLOVA, EK ;

PORTNIAGIN, AI ;

YERYOMENKO, AA ;

MOGYOROSI, P ;

KISS, JG .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 37 (02) :117-119

[4]

CARSLAW HS, 1959, CONDUCTION HEAT SOLI, P11

[5]

EGBERT G, COMMUNICATION

[6] X-RAY OBSERVATION OF DISLOCATIONS IN MN-ZN FERRITE [J].

KAWADO, S .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1970, 9 (01) :24-&

[7] CONTRIBUTION TO TIME-RESOLVED ENHANCED CHEMICAL ETCHING AND SIMULTANEOUS ANNEALING OF ION-IMPLANTATION AMORPHIZED SILICON UNDER INTENSE LASER IRRADIATION [J].

KRIMMEL, EF ;

LUTSCH, AGK ;

SWANEPOEL, R ;

BRINK, J .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 38 (02) :109-115

[8]

ROMANKIW LT, 1982, NEW DEV TRENDS, P66

[9] TEMPERATURE DISTRIBUTIONS PRODUCED BY SCANNING GAUSSIAN LASER-BEAMS [J].

SANDERS, DJ .

APPLIED OPTICS, 1984, 23 (01) :30-35

[10]

Shiosaki T., 1983, Japanese Journal of Applied Physics, Supplement, V22, P109

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