RF DRIVEN MULTICUSP H-ION SOURCE

被引：59
作者：
LEUNG, KN
DEVRIES, GJ
DIVERGILIO, WF
HAMM, RW
HAUCK, CA
KUNKEL, WB
MCDONALD, DS
WILLIAMS, MD
机构：
[1] Lawrence Berkeley Laboratory, University of California, Berkeley
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1991年 / 62卷 / 01期
关键词：
D O I：
10.1063/1.1142315
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
An rf driven multicusp source capable of generating 1-ms H- beam pulses with a repetition rate as high as 150 Hz has been developed. This source can be operated with a filament or other types of starter. There is almost no lifetime limitation and a clean plasma can be maintained for a long period of operation. It is demonstrated that rf power as high as 25 kW could be coupled inductively to the plasma via a glass-coated copper-coil antenna. The extracted H- current density achieved is about 200 mA/cm2.
引用
收藏
页码：100 / 104
页数：5
相关论文
共 13 条
12