MEASUREMENT OF THE LOW-FIELD ELECTRON-MOBILITY AND COMPENSATION RATIO PROFILES IN GAAS FIELD-EFFECT TRANSISTORS

被引:21
作者
FOLKES, PA
机构
[1] Bell Communications Research, Murray, Hill, NJ, USA, Bell Communications Research, Murray Hill, NJ, USA
关键词
D O I
10.1063/1.96521
中图分类号
O59 [应用物理学];
学科分类号
摘要
12
引用
收藏
页码:431 / 433
页数:3
相关论文
共 12 条
[2]   DETERMINATION OF THE BASIC DEVICE PARAMETERS OF A GAAS-MESFET [J].
FUKUI, H .
BELL SYSTEM TECHNICAL JOURNAL, 1979, 58 (03) :771-797
[3]   PROFILE STUDIES OF ION-IMPLANTED MESFETS [J].
GOLIO, JMM ;
TREW, RJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (12) :1844-1849
[4]   A NEW INTERPRETATION OF END RESISTANCE MEASUREMENTS [J].
LEE, K ;
SHUR, M ;
LEE, KW ;
VU, T ;
ROBERTS, P ;
HELIX, M .
IEEE ELECTRON DEVICE LETTERS, 1984, 5 (01) :5-7
[5]   VELOCITY-FIELD CHARACTERISTICS OF GAAS WITH GAMMA-6(C)-L6(C)-X6(C) CONDUCTION-BAND ORDERING [J].
LITTLEJOHN, MA ;
HAUSER, JR ;
GLISSON, TH .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (11) :4587-4590
[6]  
Many A., 1965, SEMICONDUCTOR SURFAC
[7]   COMPENSATION MECHANISMS IN GAAS [J].
MARTIN, GM ;
FARGES, JP ;
JACOB, G ;
HALLAIS, JP ;
POIBLAUD, G .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) :2840-2852
[8]   ELECTRON TRANSPORT IN GAAS [J].
RODE, DL ;
KNIGHT, S .
PHYSICAL REVIEW B-SOLID STATE, 1971, 3 (08) :2534-&
[9]  
Sze S. M., 1981, PHYSICS SEMICONDUCTO, P81
[10]   DEEP-LEVEL AND PROFILE EFFECTS UPON LOW-NOISE ION-IMPLANTED GAAS-MESFETS [J].
TREW, RJ ;
KHATIBZADEH, MA ;
MASNARI, NA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (05) :877-882