A SURFACE SPECTROSCOPIC STUDY OF METAL SUPPORT INTERACTIONS - MODEL STUDIES OF COPPER ON THIN SIO2-FILMS

被引：53

作者：

XU, XP ^{[1
]}

HE, JW ^{[1
]}

GOODMAN, DW ^{[1
]}

机构：

[1] TEXAS A&M UNIV SYST,DEPT CHEM,COLL STN,TX 77843

来源：

SURFACE SCIENCE | 1993年 / 284卷 / 1-2期

关键词：

D O I：

10.1016/0039-6028(93)90528-R

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The metal-support interactions for a model silica-supported copper catalyst have been studied using temperature-programmed desorption, X-ray photoelectron and infrared reflection-absorption spectroscopies under ultrahigh vacuum conditions. The model catalyst support was prepared by synthesizing a thin SiO2 film (approximately 100 angstrom) on a Mo(110) surface. Copper was then evaporated onto the SiO2 films. A small amount of copper (< 0.1 monolayer) is partially oxidized at the Cu/SiO2 interface with the remainder forming 3D-clusters. The desorption energy of copper from the SiO2 is found to depend markedly on copper coverage (cluster size).

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页码：103 / 108

页数：6

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