XPS, UPS AND XAES STUDIES OF THE ADSORPTION OF NITROGEN, OXYGEN, AND NITROGEN-OXIDES ON W(110) AT 300 AND 100 K .2. ADSORPTION OF NO

被引：92

作者：

MASEL, RI ^{[1
]}

UMBACH, E ^{[1
]}

FUGGLE, JC ^{[1
]}

MENZEL, D ^{[1
]}

机构：

[1] TECH UNIV MUNICH,INST FESTKORPERPHYS,DEPT PHYS E20,D-8046 GARCHING,FED REP GER

来源：

SURFACE SCIENCE | 1979年 / 79卷 / 01期

关键词：

D O I：

10.1016/0039-6028(79)90023-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The adsorption layers formed by exposure ofW(110) to NO gas at about 300 and 100 K have been investigated by XPS, UPS and XAES. At room temperature only dissociative adsorption takes place. At 100 K, the initial adsorption is also dissociative, but there is some indication of the formation of a transient NO species. Higher NO exposures lead to the formation of adsorbed N2O, which then partly desorbs and partly dissociates before 150 K is reached. This shows that N2O can be formed from N(ad) + NO. The relevance of our data to catalytic NO decomposition is discussed. © 1979.

引用

页码：26 / 38

页数：13

共 31 条

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