MODEL FOR LASER DAMAGE DEPENDENCE ON THIN-FILM MORPHOLOGY

被引:27
作者
SHAWKLEIN, LJ
BURNS, SJ
JACOBS, SD
机构
[1] UNIV ROCHESTER, DEPT MECH ENGN, MAT SCI PROGRAM, ROCHESTER, NY 14627 USA
[2] UNIV ROCHESTER, LASER ENERGET LAB, ROCHESTER, NY 14623 USA
来源
APPLIED OPTICS | 1993年 / 32卷 / 21期
关键词
D O I
10.1364/AO.32.003925
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The high laser damage thresholds often reported for porous thin films are discussed in terms of point defects or small absorbing inclusions as sites of thin-film damage initiation. The model is based on the internal pressure built up upon laser heating at short times. The competing effects of short pressure relaxation distances and low thermal conductivity inherent in porous films are discussed. The model predicts that at thicknesses less than or equal to the neck or column diameter of a porous film, the effect of lower thermal conductivity should dominate and cause the films to exhibit lower laser damage thresholds than their denser counterparts.
引用
收藏
页码:3925 / 3929
页数:5
相关论文
共 21 条
[11]  
LAMBROPOULOS JC, 1989, 1ST INT CER SCI TECH
[12]   PULSED LASER DAMAGE IN THIN-FILM COATINGS - FLUORIDES AND OXIDES [J].
LANGE, MR ;
MCIVER, JK ;
GUENTHER, AH .
THIN SOLID FILMS, 1985, 125 (1-2) :143-155
[14]   TOWARD QUANTIFICATION OF THIN-FILM MORPHOLOGY [J].
MESSIER, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :490-495
[15]  
SHAWKLEIN LJ, IN PRESS J MATER RES
[16]  
STARKE A, 1990, OPTICALL THIN FILMS, V1270, P299
[17]   PULSED LASER-INDUCED DAMAGE TO THIN-FILM OPTICAL COATINGS .2. THEORY [J].
WALKER, TW ;
GUENTHER, AH ;
NIELSEN, P .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1981, 17 (10) :2053-2065
[18]   AGING INFLUENCE ON THE ABSORPTION AND LASER DAMAGE RESISTANCE OF TA2O5 THIN-FILMS [J].
WOLF, R ;
ZSCHERPE, G ;
WELSCH, E ;
GOEPNER, V ;
SCHAFER, D .
JOURNAL OF MODERN OPTICS, 1987, 34 (12) :1585-1588
[19]  
WOOD RM, 1986, LASER DAMAGE OPTICAL
[20]   HIGHLY DAMAGE RESISTANT, BROAD-BAND, HARD ANTIREFLECTION COATING FOR HIGH-POWER LASERS IN THE ULTRAVIOLET TO NEAR-INFRARED WAVELENGTH REGIONS [J].
YOSHIDA, K ;
YOSHIDA, H ;
KATO, Y ;
YAMANAKA, C .
APPLIED PHYSICS LETTERS, 1985, 47 (09) :911-913