STRESSES AND DEFORMATION PROCESSES IN THIN-FILMS ON SUBSTRATES

被引：506

作者：

DOERNER, MF ^{[1
]}

NIX, WD ^{[1
]}

机构：

[1] IBM CORP,DIV GEN PROD,SAN JOSE,CA 95114

来源：

CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES | 1988年 / 14卷 / 03期

关键词：

This work was supported in part by the Directorate of Electronic and Materials Sciences of the Air Force Office of Scientific Research under Grant No. AFOSR 86-0051 and by the NSF-MRL Program at Stanford University through the Thin-Films Thrust Program of the Center for Materials Research. The authors gratefully acknowledge the assistance of Prof. D. M. Barnett in solving several diffusion problems associated with the development of intrinsic stress by vacancy annihilation;

D O I：

10.1080/10408438808243734

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

135

引用

页码：225 / 268

页数：44