UHV MICROSCOPY OF SURFACES AND THIN-FILM GROWTH

被引：0
作者：
TAKAYANAGI, K
机构：
来源：
ELECTRON MICROSCOPY AND ANALYSIS 1993 | 1993年 / 138期
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In-situ high-resolution UHV electron microscopy and high-temperature STM are used for studies of fine particles, surfaces and thin film growths at atomic level. Atomic surface structures are well seen by profile-view and planview imaging. By convergent beam high resolution imaging, a new surface reconstruction appearing on a surface of fine Ge particles and absorbed structures of (Bi, Pb) on Si(111) surfaces are imaged. To study the dynamics of the condensation process at atomic level, in-situ STM is applied for the condensation of Ag on Si(111) 7x7 surface.
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页码：17 / 24
页数：8
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