PRECURSOR ADSORPTION OF OXYGEN ON SI(111) AT LOW-TEMPERATURES

被引：3

|

作者：

SILVESTRE, C

SHAYEGAN, M

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575125

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

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页码：798 / 800

页数：3

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