INGAAS RESONANT-TUNNELING TRANSISTORS USING A COUPLED-QUANTUM-WELL BASE WITH STRAINED ALAS TUNNEL BARRIERS

被引:10
作者
KOCH, S
WAHO, T
MIZUTANI, T
机构
[1] NTT LSI Laboratories, Atsugi, Kanagawa 243-01
关键词
D O I
10.1109/16.310099
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A bipolar-type resonant tunneling transistor is studied of which the base is identical to a coupled quantum well. On the basis of the InGaAs material system strained AlAs tunnel barriers and a graded InGaAlAs emitter are used. Molecular beam epitaxy growth conditions are studied, showing a specific influence of growth temperature and arsenic pressure. We find clear evidence for resonant tunneling: a saturation of the collector current and a maximum of the transconductance with increasing base-emitter bias in a three-terminal transistor structure. A corresponding effect in a phototransistor structure is found as a maximum of differential current gain with increasing incident light intensity. Room temperature and low temperature (80K) high-frequency properties are determined and are used to estimate the resonant tunneling time.
引用
收藏
页码:1498 / 1503
页数:6
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