SOLID-STATE EPITAXIAL-GROWTH OF DEPOSITED SI FILMS

被引：56

|

作者：

VONALLMEN, M ^{[1
]}

LAU, SS ^{[1
]}

MAYER, JW ^{[1
]}

TSENG, WF ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC 20375

来源：

APPLIED PHYSICS LETTERS | 1979年 / 35卷 / 03期

关键词：

D O I：

10.1063/1.91071

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：280 / 282

页数：3

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