SOLID-STATE EPITAXIAL-GROWTH OF DEPOSITED SI FILMS

被引：56
|
作者：
VONALLMEN, M [1 ]
LAU, SS [1 ]
MAYER, JW [1 ]
TSENG, WF [1 ]
机构：
[1] USN,RES LAB,WASHINGTON,DC 20375
来源：
APPLIED PHYSICS LETTERS | 1979年 / 35卷 / 03期
关键词：
D O I：
10.1063/1.91071
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：280 / 282
页数：3
相关论文
共 50 条
  • [21] SOLID-PHASE EPITAXIAL-GROWTH OF SI THROUGH AL FILM
    MAJNI, G
    OTTAVIANI, G
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) : C290 - C290
  • [22] EPITAXIAL-GROWTH OF ALPHA-FE FILMS ON SI(111) SUBSTRATES
    CHENG, YT
    CHEN, YL
    KARMARKAR, MM
    MENG, WJ
    APPLIED PHYSICS LETTERS, 1991, 59 (08) : 953 - 955
  • [23] EPITAXIAL-GROWTH OF SILICON AND GERMANIUM FILMS ON CAF2/SI
    BARKAI, M
    LEREAH, Y
    GRUNBAUM, E
    DEUTSCHER, G
    THIN SOLID FILMS, 1986, 139 (03) : 287 - 297
  • [24] EPITAXIAL-GROWTH OF SOLID-SOLUTIONS OF ZNSIP2 IN SI
    POPOV, VP
    PAMPLIN, BR
    JOURNAL OF CRYSTAL GROWTH, 1972, 15 (02) : 129 - &
  • [25] EPITAXIAL-GROWTH OF CU FILMS ON SI BY IONIZED CLUSTER BEAM DEPOSITION
    SOSNOWSKI, M
    USUI, H
    YAMADA, I
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 1470 - 1473
  • [26] EPITAXIAL-GROWTH OF TETRAPHENYLMETALPORPHYRIN FILMS VAPOR-DEPOSITED ON ALKALI-HALIDES
    HAYASHI, S
    YANAGI, H
    UEDA, Y
    FUJIYOSHI, Y
    ASHIDA, M
    ULTRAMICROSCOPY, 1993, 49 (1-4) : 308 - 317
  • [27] EPITAXIAL-GROWTH OF CEO2 FILMS ON SI(111) BY SPUTTERING
    YAEGASHI, S
    KURIHARA, T
    HOSHI, H
    SEGAWA, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (1A): : 270 - 274
  • [28] EPITAXIAL-GROWTH AND MAGNETIC-PROPERTIES OF FE FILMS ON SI SUBSTRATES
    YAEGASHI, S
    KURIHARA, T
    SATO, K
    SEGAWA, H
    IEEE TRANSACTIONS ON MAGNETICS, 1994, 30 (06) : 4836 - 4838
  • [29] EPITAXIAL-GROWTH OF ZRN ON SI(100)
    BARNETT, SA
    HULTMAN, L
    SUNDGREN, JE
    RONIN, F
    ROHDE, S
    APPLIED PHYSICS LETTERS, 1988, 53 (05) : 400 - 402
  • [30] SOLID SOURCE MOCVD FOR THE EPITAXIAL-GROWTH OF THIN OXIDE-FILMS
    LU, Z
    FEIGELSON, RS
    ROUTE, RK
    DICAROLIS, SA
    HISKES, R
    JACOWITZ, RD
    JOURNAL OF CRYSTAL GROWTH, 1993, 128 (1-4) : 788 - 792
12345