CONDUCTION PROCESSES IN ANODIC TANTALUM OXIDE THIN-FILMS WITH GOLD COUNTER-ELECTRODES

被引：13

作者：

GUBANSKI, SM ^{[1
]}

HUGHES, DM ^{[1
]}

机构：

[1] UNIV COLL N WALES,SCH ELECTR ENGN,BANGOR LL57 1UT,GWYNEDD,WALES

来源：

THIN SOLID FILMS | 1978年 / 52卷 / 01期

关键词：

D O I：

10.1016/0040-6090(78)90263-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：119 / 127

页数：9

共 14 条

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[2] ELECTRICAL-CONDUCTION IN REACTIVELY SPUTTERED TANTALUM OXIDE THIN-FILMS [J].

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HUGHES, DM .

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[5]

OCOLMAIN DC, 1977, THESIS U COLLEGE N W

[6]

OGLOCK DG, 1971, APPL PHYS LETT, V19, P403

[7] DIELECTRIC PROPERTIES OF TA2O5 THIN FILMS [J].

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WILCOX, PS ;

YOUNG, L .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (10) :3891-&

[8] INTERPRETATION OF ONE-CARRIER THERMALLY STIMULATED CURRENTS AND ISOTHERMAL DECAY CURRENTS .3. INFLUENCE OF BLOCKING CONTACTS [J].

SAMOC, A ;

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SWORAKOWSKI, J .

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1977, 39 (01) :337-344

[9] P-I-N JUNCTION IN THE ANODIC OXIDE FILM OF TANTALUM [J].

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[10]

SCHWARTZ N, 1969, J ELECTROCHEM SOC, V116, P460

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