NORMAL-INCIDENCE STRAINED-LAYER SUPERLATTICE GE0.5SI0.5/SI PHOTODIODES NEAR 1.3 MU-M

被引:58
作者
HUANG, FY
ZHU, X
TANNER, MO
WANG, KL
机构
[1] Device Research Laboratory, Electrical Engineering Department, University of California-Los Angeles, Los Angeles
关键词
D O I
10.1063/1.115171
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ge0.5Si0.5 strained-layer pin photodiodes, in which multiple strained layers serve as the absorption region, have been fabricated. These devices exhibit an optical response at wavelengths beyond 1.3 mu m at normal incidence. The measured external quantum efficiencies at an applied bias of 4 V are 17% at 0.85 mu m and 1% at 1.3 mu m, respectively. Excellent electrical characteristics evidenced by the avalanche breakdown at 20 V have also been demonstrated. (C) 1995 American Institute of Physics.
引用
收藏
页码:566 / 568
页数:3
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