Admission of pure gases to vacuum systems

被引：10

作者：

Jossem, EL ^{[1
]}

机构：

[1] Cornell Univ, Ithaca, NY USA

来源：

关键词：

D O I：

10.1063/1.1751672

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：164 / 166

页数：3

共 13 条

[1] The mechanism of activated diffusion through silica glass [J].

Barrer, RM .

JOURNAL OF THE CHEMICAL SOCIETY, 1934, :378-386

[2]

Barrer RM, 1939, PHILOS MAG, V28, P148

[3]

BARRER RM, 1939, PHILOS MAG, V28, P358

[4] The diffusion of hydrogen through oxygen-free copper [J].

Ham, WR .

[5]

MCBAIN JW, 1932, SORPTION GASES SOLID

[6] Use of surface states to explain activated adsorption [J].

Pollard, WG .

PHYSICAL REVIEW, 1939, 56 (04) :324-336

[7]

RICHARDSON, 1904, PHILOS MAG, V8, P1

Simons, JH ;

Ham, WR .

[9] The diffusion of gases through metals [J].

Smithells, CJ ;

Ransley, CE .

[10]

SMITHELLS CJ, 1938, J ROY SOC ARTS, V86, P951