SOME STRUCTURAL DEPENDENT ELECTRICAL PROPERTIES OF TANTALUM-TANTALUM OXIDE THIN-FILM RESISTORS

被引：3

作者：

WEBER, RJ

机构：

来源：

IEEE TRANSACTIONS ON PARTS MATERIALS AND PACKAGING | 1967年 / PMP3卷 / 01期

关键词：

D O I：

10.1109/TPMP.1967.1135714

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：14 / &

共 12 条

[1] ALTMAN C, 1962, AM VAC SOC NATL VAC, V9, P174
[2] DEPOSITION OF TANTALUM FILMS WITH OPEN-ENDED VACUUM SYSTEM
BALDE, JW
DINEEN, JJ
CHARSCHAN, SS
[J]. BELL SYSTEM TECHNICAL JOURNAL, 1964, 43 (1P1): : 127 - +
[3] SURVEY OF CONDUCTION MECHANISMS IN VERY THIN FILMS
BASHARA, NM
[J]. IEEE TRANSACTIONS ON COMPONENT PARTS, 1964, CP11 (01): : 4 - +
[4] BASSECHES H, 1961, IRE T COMPONENTS, VCP 8, P51
[5] BERRY RW, 1964, P ELECTRONIC COMP C, P86
[6] CALBICK CJ, 1962, AM VAC SOC NATL VAC, V9, P81
[7] The conductivity of thin metallic films according to the electron theory of metals
Fuchs, K
[J]. PROCEEDINGS OF THE CAMBRIDGE PHILOSOPHICAL SOCIETY, 1938, 34 : 100 - 108
[8] ELECTRICAL CONDUCTION IN DISCONTINUOUS THIN METAL FILMS
HARTMAN, TE
[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (04) : 943 - &
[9] JOHNSON WJ, 1964, TANTALUM THINFILM RE
[10] MASKALICK NJ, 1963, AM VAC SOC NATL VAC, V10, P503