OBSERVATION OF A NEW AL(111)/SI(111) ORIENTATIONAL EPITAXY

被引：36

作者：

YAPSIR, AS ^{[1
]}

CHOI, CH ^{[1
]}

LU, TM ^{[1
]}

机构：

[1] RENSSELAER POLYTECH INST,DEPT PHYS,TROY,NY 12180

来源：

JOURNAL OF APPLIED PHYSICS | 1990年 / 67卷 / 02期

关键词：

D O I：

10.1063/1.345734

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new Al(111)/Si(111) orientational epitaxy using x-ray pole figure analysis is reported. The new structure has a 19°rotation with respect to the parallel epitaxy. The results are explained using a geometrical lattice matching concept.

引用

页码：796 / 799

页数：4

共 11 条

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