A CONTRIBUTION TO THE THEORY OF BEAM-INDUCED CURRENT CHARACTERIZATION OF DISLOCATIONS - COMMENT

被引:10
作者
DONOLATO, C
机构
[1] Consiglio Nazionale Delle Ricerche, Istituto di Chimica e Tecnologia dei Materiali e dei Componenti Per l'Elettronica (LAMEL), I-40126 Bologna
关键词
D O I
10.1063/1.349680
中图分类号
O59 [应用物理学];
学科分类号
摘要
Pasemann [J. Appl. Phys. 69, 6387 (1991)] has recently compared exact and first-order calculations of the charge collection contrast of a straight dislocation perpendicular to the surface of a semiconductor, finding substantially different dependence on the beam energy at low beam energies. Here it is shown that Pasemann's result is only a consequence of having used finite values of the dislocation radius in the exact evaluations and zero in the approximate ones. For nonvanishing dislocation radius, the first-order approximation reproduces the exact contrast trend at any beam energy.
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页码:7657 / 7659
页数:3
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