MICROCHEMICAL ANALYSIS OF THIN-FILMS BY ELASTIC-SCATTERING OF HE-3

被引:0
作者
BUCH, J
BALALIKIN, NI
机构
关键词
D O I
暂无
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
引用
收藏
页码:19 / 25
页数:7
相关论文
共 14 条
  • [1] ASSESSMENT OF ION-INDUCED X-RAYS FOR ANALYSIS
    CAIRNS, JA
    MARWICK, AD
    MITCHELL, IV
    [J]. THIN SOLID FILMS, 1973, 19 (01) : 91 - 102
  • [2] SEM, AUGER-SPECTROSCOPY AND ION BACKSCATTERING TECHNIQUES APPLIED TO ANALYSES OF AU-REFRACTORY METALLIZATIONS
    CHRISTOU, A
    JARVIS, L
    WEISENBERGER, WH
    HIRVONEN, JK
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 1975, 4 (02) : 329 - 345
  • [3] RANGE DISTRIBUTION OF IMPLANTED IONS IN SIO2, SI3N4, AND AL2O3
    CHU, WK
    CROWDER, BL
    MAYER, JW
    ZIEGLER, JF
    [J]. APPLIED PHYSICS LETTERS, 1973, 22 (10) : 490 - 492
  • [4] ION-BEAM ANALYSIS OF CORROSION FILMS ON 316 STEEL
    DEARNALEY, G
    HARTLEY, NEW
    TURNER, JF
    GARNSEY, R
    WOOLSEY, IS
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 449 - 453
  • [5] DUNNING KL, 1973, THIN SOL FILMS, V19, P146
  • [6] GRAY TJ, 1973, THIN SOL FILMS, V19, P102
  • [7] STUDIES ON AL2O3-TI-MO-AU METALLIZATION SYSTEM
    HARRIS, JM
    LUGUJJO, E
    CAMPISANO, SU
    NICOLET, MA
    SHIMA, R
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 524 - 527
  • [8] ELEMENTAL ANALYSIS BY ELASTIC SCATTERING
    JOLLY, RK
    WHITE, HB
    [J]. NUCLEAR INSTRUMENTS & METHODS, 1971, 97 (02): : 299 - &
  • [9] MEASUREMENT OF BORON DISTRIBUTION IN B-10-IMPLANTED SILICON BY (N,ALPHA) NUCLEAR-REACTION
    MEZEY, G
    SZOKEFAL.Z
    BADINKA, C
    [J]. THIN SOLID FILMS, 1973, 19 (01) : 173 - 175
  • [10] PALMBERG PW, 1973, ANAL CHEM, V45, pA549