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OXIDE CHARGE REDUCTION BY CHEMICAL GETTERING WITH TRICHLOROETHYLENE DURING THERMAL OXIDATION OF SILICON
被引:32
作者
:
CHEN, MC
论文数:
0
引用数:
0
h-index:
0
CHEN, MC
HILE, JW
论文数:
0
引用数:
0
h-index:
0
HILE, JW
机构
:
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1972年
/ 119卷
/ 02期
关键词
:
D O I
:
10.1149/1.2404165
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:223 / +
页数:1
相关论文
共 15 条
[1]
PREPARATION AND C-V CHARACTERISTICS OF SI-SI3N4 AND SI-SIO2-SI3N4 STRUCTURES
[J].
CHU, TL
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SOLID-STATE ELECTRONICS,
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(09)
:897
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[2]
CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON
[J].
DEAL, BE
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0
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DEAL, BE
;
SKLAR, M
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GROVE, AS
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SNOW, EH
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SNOW, EH
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
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114
(03)
:266
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[3]
AN INVESTIGATION OF INSTABILITY AND CHARGE MOTION IN METAL-SILICON OXIDE-SILICON STRUCTURES
[J].
HOFSTEIN, SR
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HOFSTEIN, SR
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(02)
:222
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[4]
STABILIZATION OF MOS DEVICES
[J].
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SOLID-STATE ELECTRONICS,
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:657
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[5]
EVIDENCE OF HOLE INJECTION AND TRAPPING IN SILICON NITRIDE FILMS PREPARED BY REACTIVE SPUTTERING
[J].
HU, SM
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APPLIED PHYSICS LETTERS,
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STABILIZATION OF SIO2 PASSIVATION LAYERS WITH P2O5
[J].
KERR, DR
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KERR, DR
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LOGAN, JS
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BURKHARDT, PJ
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:376
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[7]
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[8]
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SOLID-STATE ELECTRONICS,
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[9]
INVESTIGATION OF SILICON-SILICON DIOXIDE INTERFACE USING MOS STRUCTURE
[J].
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(02)
:180
-&
[10]
SILICON DIOXIDE FILMS DOPED WITH PHOSPHORUS
[J].
MIURA, Y
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0
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0
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MIURA, Y
;
TANAKA, S
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;
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.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1966,
113
(04)
:399
-&
←
1
2
→
共 15 条
[1]
PREPARATION AND C-V CHARACTERISTICS OF SI-SI3N4 AND SI-SIO2-SI3N4 STRUCTURES
[J].
CHU, TL
论文数:
0
引用数:
0
h-index:
0
CHU, TL
;
SZEDON, JR
论文数:
0
引用数:
0
h-index:
0
SZEDON, JR
;
LEE, CH
论文数:
0
引用数:
0
h-index:
0
LEE, CH
.
SOLID-STATE ELECTRONICS,
1967,
10
(09)
:897
-&
[2]
CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON
[J].
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
;
SKLAR, M
论文数:
0
引用数:
0
h-index:
0
SKLAR, M
;
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
;
SNOW, EH
论文数:
0
引用数:
0
h-index:
0
SNOW, EH
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967,
114
(03)
:266
-+
[3]
AN INVESTIGATION OF INSTABILITY AND CHARGE MOTION IN METAL-SILICON OXIDE-SILICON STRUCTURES
[J].
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1966,
ED13
(02)
:222
-+
[4]
STABILIZATION OF MOS DEVICES
[J].
HOFSTEIN, SR
论文数:
0
引用数:
0
h-index:
0
HOFSTEIN, SR
.
SOLID-STATE ELECTRONICS,
1967,
10
(07)
:657
-+
[5]
EVIDENCE OF HOLE INJECTION AND TRAPPING IN SILICON NITRIDE FILMS PREPARED BY REACTIVE SPUTTERING
[J].
HU, SM
论文数:
0
引用数:
0
h-index:
0
HU, SM
;
KERR, DR
论文数:
0
引用数:
0
h-index:
0
KERR, DR
;
GREGOR, LV
论文数:
0
引用数:
0
h-index:
0
GREGOR, LV
.
APPLIED PHYSICS LETTERS,
1967,
10
(03)
:97
-&
[6]
STABILIZATION OF SIO2 PASSIVATION LAYERS WITH P2O5
[J].
KERR, DR
论文数:
0
引用数:
0
h-index:
0
KERR, DR
;
LOGAN, JS
论文数:
0
引用数:
0
h-index:
0
LOGAN, JS
;
BURKHARDT, PJ
论文数:
0
引用数:
0
h-index:
0
BURKHARDT, PJ
;
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
PLISKIN, WA
.
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1964,
8
(04)
:376
-&
[7]
KRIEGLER RJ, 1971, 79 PAP PRES EL SOC M
[8]
FIELD EFFECT STUDIES OF OXIDIZED SILICON SURFACE
[J].
LINDMAYER, J
论文数:
0
引用数:
0
h-index:
0
LINDMAYER, J
.
SOLID-STATE ELECTRONICS,
1966,
9
(03)
:225
-+
[9]
INVESTIGATION OF SILICON-SILICON DIOXIDE INTERFACE USING MOS STRUCTURE
[J].
MIURA, Y
论文数:
0
引用数:
0
h-index:
0
MIURA, Y
;
MATUKURA, Y
论文数:
0
引用数:
0
h-index:
0
MATUKURA, Y
.
JAPANESE JOURNAL OF APPLIED PHYSICS,
1966,
5
(02)
:180
-&
[10]
SILICON DIOXIDE FILMS DOPED WITH PHOSPHORUS
[J].
MIURA, Y
论文数:
0
引用数:
0
h-index:
0
MIURA, Y
;
TANAKA, S
论文数:
0
引用数:
0
h-index:
0
TANAKA, S
;
MATUKURA, Y
论文数:
0
引用数:
0
h-index:
0
MATUKURA, Y
;
OSAFUNE, H
论文数:
0
引用数:
0
h-index:
0
OSAFUNE, H
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1966,
113
(04)
:399
-&
←
1
2
→