EFFECTS OF ANNEALING ON THE STRUCTURE AND ELECTRICAL-CONDUCTIVITY OF CVD ALUMINA FILMS

被引:5
作者
WONG, AS
MICHAL, GM
LOCCI, IE
CHEUNG, PW
机构
[1] CASE WESTERN RESERVE UNIV,CTR ELECTR DESIGN,CLEVELAND,OH 44106
[2] CASE WESTERN RESERVE UNIV,DEPT MAT SCI & ENGN,CLEVELAND,OH 44106
[3] UNIV WASHINGTON,DEPT ELECT ENGN,SEATTLE,WA 98195
关键词
D O I
10.1557/JMR.1988.1002
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:1002 / 1009
页数:8
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