Structure and Properties of thin Hard Coating Tialn layers Deposited by pvd on Heated Substrate wc/co

被引：0
作者：
El-Awadi, G. A. [1 ]
Abdel-Samad, S. [1 ]
Waheed, A. F. [1 ]
机构：
[1] Atom Energy Author, Nucl Res Ctr, Dept Nucl Phys, Cyclotron Project, Cairo, Egypt
来源：
ARAB JOURNAL OF NUCLEAR SCIENCES AND APPLICATIONS | 2014年 / 47卷 / 01期
关键词：
TiAlN; PVD; hardness; scratch test; XRD; impact test;
D O I：
暂无
中图分类号：
TL [原子能技术]; O571 [原子核物理学];
学科分类号：
0827 ; 082701 ;
摘要：
TiAlN coatings have been widely used for cutting tools, especially for dry and high speed machining. The properties of the layers deposited by PVD (Physical Vapor Deposition) are affected by many parameters of deposition conditions. These include percentage and type of reactive gas, vacuum pressure, time of deposition, type of target materials, power of deposition, and temperature of substrate. In this work, the properties of TiAlN layers deposited on elevated substrate temperature at 480 degrees C at different ratios of nitrogen reactive gas with working pressure 10(-2) mbar were studied. The layers were investigated by scratch test, collate measurements, hardness measurements, impact test, Tribometer pin on disc and Optical microscopy.
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收藏
页码：138 / 144
页数：7
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