REFRACTIVE-INDEX CHANGES IN FUSED-SILICA PRODUCED BY HEAVY-ION IMPLANTATION FOLLOWED BY PHOTOBLEACHING

被引：40

作者：

ALBERT, J ^{[1
]}

MALO, B ^{[1
]}

HILL, KO ^{[1
]}

JOHNSON, DC ^{[1
]}

BREBNER, JL ^{[1
]}

LEONELLI, R ^{[1
]}

机构：

[1] UNIV MONTREAL,DEPT PHYS,RECH PHYS & TECHNOL COUCHES MINCES GRP,MONTREAL H3C 3J7,QUEBEC,CANADA

来源：

OPTICS LETTERS | 1992年 / 17卷 / 23期

关键词：

D O I：

10.1364/OL.17.001652

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The changes in refractive index, optical absorption, and volume of synthetic fused silica resulting from the implantation of germanium and silicon ions at energies of 3 and 5 MeV are reported. Implantation changes the density and generates ultraviolet color centers m the silica, which increases the refractive index at visible wavelengths by approximately 1%. Irradiation of the implanted samples with 249-nm light from a KrF excimer laser photobleaches the color centers and reduces the index by more than 0.1%. Photobleaching is used to write a 4.3-mum pitch diffraction grating in the implanted silica.

引用

页码：1652 / 1654

页数：3

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