DEPTH RESOLUTION OF SPUTTER PROFILING

被引：519
作者：
ANDERSEN, HH
机构：
来源：
APPLIED PHYSICS | 1979年 / 18卷 / 02期
关键词：
D O I：
10.1007/BF00934407
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：131 / 140
页数：10
相关论文
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