Nanoelectronics: the Hall Effect and Measurement of Electrochemical Potentials by "Bottom-Up" Approach

被引:0
|
作者
Kruglyak, Yu. A. [1 ]
Kondratenko, P. A. [2 ]
Lopatkin, Yu. M. [3 ]
机构
[1] Odessa State Environm Univ, 15 Lviv Str, UA-65016 Odessa, Ukraine
[2] Natl Aviat Univ, UA-03058 Kiev, Ukraine
[3] Sumy State Univ, UA-40007 Sumy, Ukraine
关键词
Nanophysics; Nanoelectronics; Molecular electronics; Bottom-up; Hall effect; Quantum Hall effect; QHE; Chemical potential; Electrochemical potential; Landau levels; Edge states; Graphene; NEGF;
D O I
暂无
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Classical and quantum Hall effects, measurement of electrochemical potentials, the Landauer formulas and Buttiker formula, measurement of Hall potential, an account of magnetic field in the NEGF method, quantum Hall effect, Landau method, and edge states in graphene are discussed in the frame of the "bottom-up" approach of modern nanoelectronics.
引用
收藏
页数:15
相关论文
共 50 条
  • [1] Bottom-up approach to silicon nanoelectronics
    Mizuta, Hiroshi
    Oda, Shunri
    MICROELECTRONICS JOURNAL, 2008, 39 (02) : 171 - 176
  • [2] Bottom-up nanoelectronics
    Hadley, P
    34TH EUROPEAN MICROWAVE CONFERENCE, VOLS 1-3, CONFERENCE PROCEEDINGS, 2004, : 141 - 145
  • [3] Nanoelectronics: Thermoelectric Phenomena in "Bottom-Up" Approach
    Kruglyak, Yu. A.
    Kondratenko, P. A.
    Lopatkin, Yu. M.
    JOURNAL OF NANO- AND ELECTRONIC PHYSICS, 2014, 6 (01)
  • [4] Nanoelectronics. Spin transport in the NEGF method and quantum spin Hall effect by "bottom-up" approach
    Kruglyak, Yu. A.
    Kondratenko, P. A.
    Lopatkin, Yu. M.
    JOURNAL OF NANO- AND ELECTRONIC PHYSICS, 2015, 7 (04)
  • [5] Bottom-up silicon nanoelectronics
    Mizuta, H
    Khalafalla, M
    Durrani, ZAK
    Uno, S
    Koshida, N
    Tsuchiya, Y
    Oda, S
    2004: 7TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUITS TECHNOLOGY, VOLS 1- 3, PROCEEDINGS, 2004, : 864 - 868
  • [6] Silicon nanoelectronics: Precise fabrication via a bottom-up approach
    Seung H. Kang
    JOM, 2004, 56 : 19 - 19
  • [7] Silicon nanoelectronics: Precise fabrication via a bottom-up approach
    Kang, SH
    JOM, 2004, 56 (10) : 19 - 19
  • [8] A bottom-up approach for productivity measurement and improvement
    Jagoda, Kalinga
    Lonseth, Robert
    Lonseth, Adam
    INTERNATIONAL JOURNAL OF PRODUCTIVITY AND PERFORMANCE MANAGEMENT, 2013, 62 (04) : 387 - 406
  • [9] A bottom-up approach for the radius and roundness measurement of micro spheres
    Oertel, Erik
    Manske, Eberhard
    TM-TECHNISCHES MESSEN, 2022, 89 (s1) : 101 - 106
  • [10] Bottom-up approach for productivity measurement in large public organizations
    Jaaskelainen, Aki
    Uusi-Rauva, Erkki
    INTERNATIONAL JOURNAL OF PRODUCTIVITY AND PERFORMANCE MANAGEMENT, 2011, 60 (03) : 252 - 267