LONG-CHANNEL SILICON-ON-INSULATOR MOSFET THEORY

被引:39
作者
ORTIZCONDE, A [1 ]
HERRERA, R [1 ]
SCHMIDT, PE [1 ]
SANCHEZ, FJG [1 ]
ANDRIAN, J [1 ]
机构
[1] FLORIDA INT UNIV,DEPT ELECT & COMP ENGN,MIAMI,FL 33199
基金
美国国家科学基金会;
关键词
D O I
10.1016/0038-1101(92)90164-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Based on the procedure of Pierret and Shields [1, Solid-St. Electron. 26, 143, 1983] for the long-channel bulk MOSFET, a new single-integral expression is obtained to describe the current-voltage characteristics for the silicon-on-insulator (SOI) MOSFET. This expression is valid for: any degree of inversion, all back-gate bias conditions and any semiconductor film thickness. Our single-integral expression, applied to a given back-gate bias condition and using the appropriate approximations, can be simplified to the results of the previous models.
引用
收藏
页码:1291 / 1298
页数:8
相关论文
共 22 条
[1]   ANALYTICAL IGFET MODEL INCLUDING DRIFT AND DIFFUSION CURRENTS [J].
BACCARANI, G ;
RUDAN, M ;
SPADINI, G .
IEE JOURNAL ON SOLID-STATE AND ELECTRON DEVICES, 1978, 2 (02) :62-68
[2]   CHARGE-SHEET MODEL OF MOSFET [J].
BREWS, JR .
SOLID-STATE ELECTRONICS, 1978, 21 (02) :345-355
[3]  
BREWS JR, 1981, APPLIED SOLID ST A S, V2
[4]  
COLINGE JP, 1991, SILICON INSULATOR
[5]   A NEW ANALYTICAL MODEL FOR THE 2-TERMINAL MOS CAPACITOR ON SOI SUBSTRATE [J].
FLANDRE, D ;
VANDEWIELE, F .
IEEE ELECTRON DEVICE LETTERS, 1988, 9 (06) :296-299
[6]  
IOANNOU DE, 1991, P INT SEMICONDUCTOR, V1, P151
[7]  
LIM HK, 1984, IEEE T ELECTRON DEV, V31, P401
[8]  
LIM HK, 1983, IEEE T ELECTRON DEV, V30, P1244
[9]   NUMERICAL AND CHARGE SHEET MODELS FOR THIN-FILM SOI MOSFETS [J].
MALLIKARJUN, C ;
BHAT, KN .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (09) :2039-2051
[10]   AN ANALYTIC MODEL FOR THIN SOI TRANSISTORS [J].
MCKITTERICK, JB ;
CAVIGLIA, AL .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (06) :1133-1138