OPTIMIZATION OF QUANTITATIVE DEPTH PROFILING WITH GLOW-DISCHARGE MASS-SPECTROMETRY .1. OPTIMIZATION STUDIES ON CRATER SHAPE AND TIME DEPTH CONVERSION

被引：38

作者：

RAITH, A ^{[1
]}

HUTTON, RC ^{[1
]}

HUNEKE, JC ^{[1
]}

机构：

[1] CHARLES EVANS & ASSOCIATES,REDWOOD CITY,CA 94063

来源：

JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY | 1993年 / 8卷 / 06期

关键词：

GLOW DISCHARGE MASS SPECTROMETRY; DEPTH PROFILING; CRATER SHAPE; DEPTH RESOLUTION AND TIME DEPTH CONVERSION; SPUTTER RATES;

D O I：

10.1039/ja9930800867

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

Investigations have been performed using glow discharge mass spectrometry to determine the effect of glow discharge parameters such as voltage, current and pressure on the sputter rate and sputtered crater shape. Optimization of these parameters has been carried out on a multi-layer sample and is shown to produce a flat-bottomed sputter crater and a depth profile resolution as good as 0.03 mum (300 A). Sputter rates can be controlled to within +/- 10%, and by establishing a library of such values for a wide variety of materials, the crater depth can be calibrated against analysis time to provide accurate depth quantification. Different sputter rates can be used for routine depth profiling of various coating thicknesses from 0.1 to 200 mum.

引用

页码：867 / &

共 22 条

[1]

HALL B, SECONDARY ION MASS S, V7, P239

[2]

HULL DJ, 1988, SURF INTERFACE ANAL, V11, P40

[3] ANALYSIS OF PURE METALS USING A QUADRUPOLE-BASED GLOW-DISCHARGE MASS-SPECTROMETER .1. ANALYSIS OF COPPER [J].