THE USE OF GENERALIZED MODELS TO EXPLAIN THE BEHAVIOR OF OHMIC CONTACTS TO N-TYPE GAAS

被引:6
作者
MCNALLY, PJ
机构
[1] School of Electronic Engineering, Dublin City University, Dublin
关键词
D O I
10.1016/0038-1101(92)90249-C
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The use of two generalised carrier transport models to account for the N(D)-1 dependence of the specific contact resistance (rho(c)) of metal-semiconductor Ohmic contacts to n-type GaAs is proposed. Both models include the effects of thermionic emission and diffusion across the high-low barrier junction a priori. Calculations of rho(c), and comparison with experimental data, show conclusively that thermionic emission is the dominant transport mechanism across the barrier. It is stressed that these models do not rely on prior choices of either of the transport processes. These conclusions are arrived at a posteriori.
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页码:1705 / 1708
页数:4
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