FERMI-LEVEL PINNING IN AN AL-GE METAL-SEMICONDUCTOR JUNCTION

被引:4
作者
CIRACI, S
BARATOFF, A
BATRA, IP
机构
[1] IBM CORP,DIV RES,ALMADEN RES CTR,SAN JOSE,CA 95120
[2] IBM CORP,DIV RES,ZURICH RES LAB,CH-8803 RUSCHLIKON,SWITZERLAND
来源
PHYSICAL REVIEW B | 1991年 / 43卷 / 09期
关键词
D O I
10.1103/PhysRevB.43.7046
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We studied the energetics and electronic structure of the lattice-matched Al-Ge heterostructure using the self-consistent-field pseudopotential method. We showed that interactions at the interface are on the atomic scale and lead to directional metal-semiconductor bonds subsequent to the elimination of dangling bonds by the adsorption of metal atoms. As previously established, these bonds elongate and become less localized upon metallization of the overlayer, but their directional character is shown to be maintained. Buckling of the metal layers at the interface is favored even though metal and semiconductor lattices are almost commensurate. An analysis of the state and charge density leads to the conclusion that the Fermi level is determined by the metal states that decay into the semiconductor. It is ruled out that the dangling-bond surface states (which become resonance states in the conduction-band continua of metal) determine the Fermi level for the Al-Ge hetero-structure.
引用
收藏
页码:7046 / 7052
页数:7
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