X-RAY TOPOGRAPHIC AND X-RAY MICROANALYTICAL STUDIES ON DIFFUSION OF GOLD IN SILICON

被引：6
作者：
BRUMMER, O
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1971年 / 5卷 / 01期
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D O I：
10.1002/pssa.2210050122
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：199 / &
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