共 50 条
- [4] ON THE ROLE OF ION-BOMBARDMENT PARAMETERS IN AES SPUTTER DEPTH PROFILING OF TA2O5/TA WITH AR+ AND XE+ FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE, 1989, 333 (4-5): : 474 - 477
- [5] Original and sputtering induced interface roughness in AES sputter depth profiling of SiO2/Ta2O5 multilayers Thin Solid Films, 1999, 355 : 390 - 394