首页
学术期刊
论文检测
AIGC检测
热点
更多
数据
EPITAXIAL-GROWTH OF FERRITE FILMS BY CVD USING C-12
被引:0
|
作者
:
GIBART, P
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
GIBART, P
[
1
]
ROBBINS, M
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
ROBBINS, M
[
1
]
KANE, AB
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
KANE, AB
[
1
]
机构
:
[1]
BELL TEL LABS INC,MURRAY HILL,NJ 07974
来源
:
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
|
1973年
关键词
:
D O I
:
暂无
中图分类号
:
O6 [化学];
学科分类号
:
0703 ;
摘要
:
引用
收藏
页码:169 / &
相关论文
共 50 条
[31]
SELECTIVE GERMANIUM EPITAXIAL-GROWTH ON SILICON USING CVD TECHNOLOGY WITH ULTRA-PURE GASES
KOBAYASHI, S
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
KOBAYASHI, S
CHENG, ML
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
CHENG, ML
KOHLHASE, A
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
KOHLHASE, A
SATO, T
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
SATO, T
MUROTA, J
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
MUROTA, J
MIKOSHIBA, N
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
MIKOSHIBA, N
JOURNAL OF CRYSTAL GROWTH,
1990,
99
(1-4)
: 259
-
262
[32]
EPITAXIAL-GROWTH OF MN-SB MULTILAYERED FILMS
NAKAYAMA, N
论文数:
0
引用数:
0
h-index:
0
NAKAYAMA, N
MORITANI, I
论文数:
0
引用数:
0
h-index:
0
MORITANI, I
SHINJO, T
论文数:
0
引用数:
0
h-index:
0
SHINJO, T
NIPPON KAGAKU KAISHI,
1987,
(11)
: 1880
-
1885
[33]
EPITAXIAL-GROWTH OF METAL SINGLE-CRYSTAL FILMS
GRUNBAUM, E
论文数:
0
引用数:
0
h-index:
0
机构:
TEL AVIV UNIV,DEPT PHYS & ASTRON,TEL AVIV,ISRAEL
TEL AVIV UNIV,DEPT PHYS & ASTRON,TEL AVIV,ISRAEL
GRUNBAUM, E
VACUUM,
1974,
24
(04)
: 153
-
164
[34]
ON EPITAXIAL-GROWTH OF DIAMOND FILMS ON (100) SILICON SUBSTRATES
NARAYAN, J
论文数:
0
引用数:
0
h-index:
0
机构:
CRYSTALLUME,MENLO PARK,CA 94025
CRYSTALLUME,MENLO PARK,CA 94025
NARAYAN, J
SRIVATSA, AR
论文数:
0
引用数:
0
h-index:
0
机构:
CRYSTALLUME,MENLO PARK,CA 94025
CRYSTALLUME,MENLO PARK,CA 94025
SRIVATSA, AR
PETERS, M
论文数:
0
引用数:
0
h-index:
0
机构:
CRYSTALLUME,MENLO PARK,CA 94025
CRYSTALLUME,MENLO PARK,CA 94025
PETERS, M
YOKOTA, S
论文数:
0
引用数:
0
h-index:
0
机构:
CRYSTALLUME,MENLO PARK,CA 94025
CRYSTALLUME,MENLO PARK,CA 94025
YOKOTA, S
RAVI, KV
论文数:
0
引用数:
0
h-index:
0
机构:
CRYSTALLUME,MENLO PARK,CA 94025
CRYSTALLUME,MENLO PARK,CA 94025
RAVI, KV
APPLIED PHYSICS LETTERS,
1988,
53
(19)
: 1823
-
1825
[35]
EPITAXIAL-GROWTH OF COSI2 FILMS ON SI
SAITOH, S
论文数:
0
引用数:
0
h-index:
0
机构:
TOKYO INST TECHNOL,MIDORI KU,YOKOHAMA,JAPAN
TOKYO INST TECHNOL,MIDORI KU,YOKOHAMA,JAPAN
SAITOH, S
ISHIWARA, H
论文数:
0
引用数:
0
h-index:
0
机构:
TOKYO INST TECHNOL,MIDORI KU,YOKOHAMA,JAPAN
TOKYO INST TECHNOL,MIDORI KU,YOKOHAMA,JAPAN
ISHIWARA, H
论文数:
引用数:
h-index:
机构:
FURUKAWA, S
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(03)
: C95
-
C95
[36]
EPITAXIAL-GROWTH OF SOLUTION GROWN POLYVINYLCHLORIDE (PVC) FILMS
CHOPRA, KL
论文数:
0
引用数:
0
h-index:
0
机构:
INDIAN INST TECHNOL,DEPT PHYS,NEW DELHI 110029,INDIA
CHOPRA, KL
RASTOGI, AC
论文数:
0
引用数:
0
h-index:
0
机构:
INDIAN INST TECHNOL,DEPT PHYS,NEW DELHI 110029,INDIA
RASTOGI, AC
MALHOTRA, GL
论文数:
0
引用数:
0
h-index:
0
机构:
INDIAN INST TECHNOL,DEPT PHYS,NEW DELHI 110029,INDIA
MALHOTRA, GL
THIN SOLID FILMS,
1974,
24
(01)
: 125
-
136
[37]
EPITAXIAL-GROWTH OF GAAS FILMS FROM ELEMENTAL ARSENIC
CHU, SS
论文数:
0
引用数:
0
h-index:
0
机构:
Electrical Engineering Department, University of South Florida, Tampa
CHU, SS
CHU, TL
论文数:
0
引用数:
0
h-index:
0
机构:
Electrical Engineering Department, University of South Florida, Tampa
CHU, TL
GREEN, RF
论文数:
0
引用数:
0
h-index:
0
机构:
Electrical Engineering Department, University of South Florida, Tampa
GREEN, RF
CERNY, C
论文数:
0
引用数:
0
h-index:
0
机构:
Electrical Engineering Department, University of South Florida, Tampa
CERNY, C
JOURNAL OF APPLIED PHYSICS,
1991,
69
(12)
: 8316
-
8319
[38]
EPITAXIAL-GROWTH OF VANADIUM FILMS EVAPORATED ON NACL SUBSTRATES
YAMADA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 980,JAPAN
TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 980,JAPAN
YAMADA, Y
KASUKABE, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 980,JAPAN
TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 980,JAPAN
KASUKABE, Y
NAGATA, S
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 980,JAPAN
TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 980,JAPAN
NAGATA, S
YAMAGUCHI, S
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 980,JAPAN
TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 980,JAPAN
YAMAGUCHI, S
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1992,
31
(12A):
: 4010
-
4015
[39]
EPITAXIAL-GROWTH OF THICK SMOOTH FILMS OF ZNS ON GAAS
KAY, PMR
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MANCHESTER,ELECT ENGN LABS,MANCHESTER M13 9PL,ENGLAND
UNIV MANCHESTER,ELECT ENGN LABS,MANCHESTER M13 9PL,ENGLAND
KAY, PMR
LILLEY, P
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MANCHESTER,ELECT ENGN LABS,MANCHESTER M13 9PL,ENGLAND
UNIV MANCHESTER,ELECT ENGN LABS,MANCHESTER M13 9PL,ENGLAND
LILLEY, P
JOURNAL OF CRYSTAL GROWTH,
1975,
31
(DEC)
: 339
-
344
[40]
EPITAXIAL-GROWTH OF HIGH-TC SUPERCONDUCTING FILMS
GAVALER, JR
论文数:
0
引用数:
0
h-index:
0
GAVALER, JR
BRAGINSKI, AI
论文数:
0
引用数:
0
h-index:
0
BRAGINSKI, AI
JANOCKO, MA
论文数:
0
引用数:
0
h-index:
0
JANOCKO, MA
TALVACCHIO, J
论文数:
0
引用数:
0
h-index:
0
TALVACCHIO, J
PHYSICA B & C,
1985,
135
(1-3):
: 148
-
153
←
1
2
3
4
5
→