EFFECT OF ALLOY ADDITIONS ON ELECTROMIGRATION FAILURES IN THIN ALUMINUM FILMS

被引：34

作者：

GANGULEE, A

DHEURLE, FM

机构：

来源：

关键词：

D O I：

10.1063/1.1653828

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：76 / &

共 8 条

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DHEURLE FM, 1971, METALL T, V2, P725

[6]

DHEURLE FM, 1970, APPL PHYS LETTERS, V16, P27

[7] SOME OBSERVATIONS ON ELECTROMIGRATION IN ALUMINUM FILMS [J].

GHATE, PB .

[8]

WEINIG S, 1957, T AM I MIN MET ENG, V209, P32