REACTIVE SPUTTERING OF RUO2 FILMS

被引：61

作者：

KOLAWA, E

SO, FCT

FLICK, W

ZHAO, XA

PAN, ETS

NICOLET, MA

机构：

来源：

THIN SOLID FILMS | 1989年 / 173卷 / 02期

关键词：

D O I：

10.1016/0040-6090(89)90137-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：217 / 224

页数：8

共 15 条

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[2] SPUTTER DEPOSITION OF PLATINUM FILMS IN ARGON OXYGEN AND NEON OXYGEN DISCHARGES [J].

AITA, CR ;

TRAN, NC .

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[3] OPTICAL-EMISSION FROM NEON OXYGEN RF SPUTTERING GLOW-DISCHARGES [J].

AITA, CR ;

MARHIC, ME .

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[4] AUO+ AND AUO+2 GASEOUS-IONS FORMED DURING THE SPUTTER DEPOSITION OF AU FILMS IN AR-O2 DISCHARGES [J].

AITA, CR .

JOURNAL OF APPLIED PHYSICS, 1987, 61 (11) :5182-5184

[5]

GREEN ML, 1985, J ELECTROCHEM SOC, V132, P2077

[6] INVESTIGATION OF REACTIVELY SPUTTERED TIN FILMS FOR DIFFUSION-BARRIERS [J].

KANAMORI, S .

THIN SOLID FILMS, 1986, 136 (02) :195-214

[7] BIAS-INDUCED STRESS TRANSITIONS IN SPUTTERED TIN FILMS [J].

KATTELUS, HP ;

TANDON, JL ;

SALA, C ;

NICOLET, MA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (04) :1850-1854

[8] REACTIVELY SPUTTERED RUO2 DIFFUSION-BARRIERS [J].

KOLAWA, E ;

SO, FCT ;

PAN, ETS ;

NICOLET, MA .

APPLIED PHYSICS LETTERS, 1987, 50 (13) :854-855

[9]

KOLAWA E, 1987, VIDE, V42, P171

[10]

KOLAWA E, 1987, TUNGSTEN OTHER REFRA, V2, P311

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