SILICIDE FORMATION WITH CODEPOSITED TITANIUM-TANTALUM ALLOYS ON SILICON

被引：16

作者：

CAPIO, CD ^{[1
]}

WILLIAMS, DS ^{[1
]}

MURARKA, SP ^{[1
]}

机构：

[1] RENSSELAER POLYTECH INST,CTR INTEGRATED ELECT,DEPT MAT ENGN,TROY,NY 12180

来源：

关键词：

D O I：

10.1063/1.339678

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1257 / 1264

页数：8

共 21 条

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[16] COMPOSITION PROFILES AND SCHOTTKY-BARRIER HEIGHTS OF SILICIDES FORMED IN NIPT ALLOY-FILMS
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TERRY, LE
[J]. JOURNAL OF APPLIED PHYSICS, 1976, 47 (01) : 301 - 307
[17] THOMPSON R, 1981, J APPL PHYS, V52, P6783
[18] Tu K. N., 1978, Thin films. Interdiffusion and reactions, P359
[19] SHALLOW SILICIDE CONTACT
TU, KN
HAMMER, WN
OLOWOLAFE, JO
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (03) : 1663 - 1668
[20] SHALLOW AND PARALLEL SILICIDE CONTACTS
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