SILICIDE FORMATION WITH CODEPOSITED TITANIUM-TANTALUM ALLOYS ON SILICON

被引：16

作者：

CAPIO, CD ^{[1
]}

WILLIAMS, DS ^{[1
]}

MURARKA, SP ^{[1
]}

机构：

[1] RENSSELAER POLYTECH INST,CTR INTEGRATED ELECT,DEPT MAT ENGN,TROY,NY 12180

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 04期

关键词：

D O I：

10.1063/1.339678

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1257 / 1264

页数：8

共 21 条

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[5] STUDIES OF TI-W METALLIZATION SYSTEM ON SI
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[7] THIN-FILM INTERACTION BETWEEN TITANIUM AND POLYCRYSTALLINE SILICON
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[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) : 342 - 349
[8] SILICIDE FORMATION IN THIN COSPUTTERED (TANTALUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2
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FRASER, DB
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (03) : 1593 - 1598
[9] REFRACTORY SILICIDES OF TITANIUM AND TANTALUM FOR LOW-RESISTIVITY GATES AND INTERCONNECTS
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FRASER, DB
SINHA, AK
LEVINSTEIN, HJ
[J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1980, 15 (04) : 474 - 482
[10] CODEPOSITED SILICIDES IN VERY-LARGE-SCALE INTEGRATION
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[J]. THIN SOLID FILMS, 1986, 140 (01) : 35 - 50

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